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1 : the accuracy of the relative position of all functional patterns on any reticle with the corresponding patterns of any other reticle of a given device series when the reticles are properly superimposed. [ASTM F127-84] 2 : a vector quantity defined at every point on the wafer. It is the difference, R, between the vector position, , of a substrate geometry and the vector position of the corresponding point, , in a reference grid. 3 : in the overlay capabilities of wafer steppers, a vector quantity defined at every point on the wafer. It is the difference, R, between the vector position, , of a substrate geometry, and the vector position of the corresponding point, , in a reference grid. [SEMI P18-92]
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